• 文献标题:   A Compact Electrical Modelling for Top-Gated Doped Graphene Field-Effect Transistor
  • 文献类型:   Article
  • 作  者:   UPADHYAY AK, CHAUHAN N, VISHVAKARMA SK
  • 作者关键词:   advance channel material, device modeling, nanoelectronic, nanotechnology
  • 出版物名称:   IETE JOURNAL OF RESEARCH
  • ISSN:   0377-2063 EI 0974-780X
  • 通讯作者地址:   Indian Inst Technol
  • 被引频次:   1
  • DOI:   10.1080/03772063.2017.1355752
  • 出版年:   2018

▎ 摘  要

In this paper, we have developed an inclusive model for top-gated doped graphene field-effect transistor (GFET). The proposed model is concise and accurate for calculations of the electrical parameters that are used in digital circuit design. The doping in single layer graphene sheet is one of the ways to create a bandgap as well as to introduce the threshold voltage (V-TH) concept in GFET. Further, the modelled expressions are used for estimation of quantum capacitance (C-q), which is used for the modelling of drain current (I-D), small-signal transconductance gain (g(m)), output resistance (r(o)), and figures of merit such as intrinsic voltage gain (A(V)), transconductance efficiency (g(m)/I-D), and cut-off frequency (f(T)).