• 文献标题:   Influence of electron beam and ultraviolet irradiations on graphene field effect transistors
  • 文献类型:   Article
  • 作  者:   IQBAL MZ, SIDDIQUE S, ANWAR N
  • 作者关键词:   graphene, chemical vapor deposition, field effect transistor, electron beam irradiation, ultraviolet irradiation
  • 出版物名称:   OPTICAL MATERIALS
  • ISSN:   0925-3467 EI 1873-1252
  • 通讯作者地址:   GIK Inst Engn Sci Technol
  • 被引频次:   3
  • DOI:   10.1016/j.optmat.2017.06.039
  • 出版年:   2017

▎ 摘  要

Electrical transport properties of graphene can be modulated by different controlled doping methods in order to make it useful for practical applications. Here we report a comparative study of electron-beam (e-beam) irradiated and ultraviolet (UV) irradiated graphene field effect transistors (FETs) for different doses and exposure times. We observed red shift in Raman spectra of graphene under e-beam irradiation which represents n-type doping while a divergent trend has been identified for UV irradiations which signify p-type doping. These results are further confirmed by the electrical transport measurements where the Dirac point shifts towards negative backgate voltage (i.e. n-type doping) upon e-beam exposure and shifted towards positive backgate voltage (i.e. p-type doping) under ultraviolet irradiation. Our approach reveals the dual characteristics of graphene FETs under these irradiation environments. (C) 2017 Elsevier B.V. All rights reserved.