• 文献标题:   In-situ monitoring of AuCl3-doping and -dedoping behaviors in graphene
  • 文献类型:   Article
  • 作  者:   SHIN DH, KIM S, JANG CW, KIM JM, KIM JH, CHOI SH
  • 作者关键词:   graphene, aucl3 doping, dedoping, in situ, annealing, cl anion
  • 出版物名称:   JOURNAL OF THE KOREAN PHYSICAL SOCIETY
  • ISSN:   0374-4884 EI 1976-8524
  • 通讯作者地址:   Kyung Hee Univ
  • 被引频次:   4
  • DOI:   10.3938/jkps.64.1327
  • 出版年:   2014

▎ 摘  要

In-situ variations of the surface morphology, transmittance, sheet resistance, and Dirac curve of graphene have been monitored during AuCl3-doping and annealing-induced-dedoping processes. The transmittance of graphene shows a monotonically-decreasing behavior due to doping and subequent annealing at higher temperatures (T (A) ), resulting from the continuing increase in the surface corrugations due to intensified coalescing of Au clusters. Electronic parameters, such as the sheet resistance, work function, Dirac point, and electron mobility, show their extreme values when annealed at 50 A degrees C after doping, which can be attributed to further enhancement of a reaction donating electrons to Cl ions from graphene at T (A) = 50 A degrees C. The annealing at higher T (A) induces a dedoping effect due to the Cl desorption, thereby decreasing the doping efficiency. These results suggest that Cl anions play a crucial role in the doping and the dedoping processes, especially causing variations in the electronic properties of graphene.