▎ 摘　　要

Multilayer graphene (MLG) on a Cu substrate was successfully fabricated via a solid-source chemical vapor deposition process using fluorene as the solid source. The surface coverage of graphene was greater than 98% even at 6 min, and the MLG ratio was similar to 97%, indicating that our growth method selectively promoted MLG growth from the beginning of graphene growth. The oxidation suppression characteristics of MLG were confirmed using electron back-scattered diffraction (EBSD) analysis. Cu crystal orientations were identified only under areas covered by graphene, indicating that the oxidation of Cu did not proceed at the interface between Cu and graphene. We confirmed using EBSD techniques that MLG suppresses the surface oxidation of a Cu substrate. Furthermore, we showed that EBSD was an effective tool for evaluating surface oxidation as well as surface crystal orientations.