• 文献标题:   Oxidation Resistance of Reactive Atoms in Graphene
  • 文献类型:   Article
  • 作  者:   CHISHOLM MF, DUSCHER G, WINDL W
  • 作者关键词:   graphene, impurity oxidation, adf imaging, aberrationcorrection
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Oak Ridge Natl Lab
  • 被引频次:   44
  • DOI:   10.1021/nl301952e
  • 出版年:   2012

▎ 摘  要

We have found that reactive elements that are normally oxidized at room temperature are present as individual atoms or clusters on and in graphene. Oxygen is present in these samples but it is only detected in the thicker amorphous carbon layers present in the graphene specimens we have examined. However, we have seen no evidence that oxygen reacts with the impurity atoms and small clusters of these normally reactive elements when they are incorporated in the graphene layers. First principles calculations suggest that the oxidation resistance is due to kinetic effects such as preferential bonding of oxygen to nonincorporated atoms and H passivation. The observed oxidation resistance of reactive atoms in graphene may allow the use of these incorporated metals in catalytic applications. It also opens the possibility of designing and producing electronic, opto-electronic, and magnetic devices based on these normally reactive atoms.