• 文献标题:   Growth of High-Purity and High-Quality Turbostratic Graphene with Different Interlayer Spacings
  • 文献类型:   Article, Early Access
  • 作  者:   KOKMAT P, SURINLERT P, RUAMMAITREE A
  • 作者关键词:  
  • 出版物名称:   ACS OMEGA
  • ISSN:   2470-1343
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1021/acsomega.2c06834 EA JAN 2023
  • 出版年:   2023

▎ 摘  要

Turbostratic graphene is a multilayer graphene, which has exotic electrical properties similar to those of monolayer graphene due to the low interlayer interaction. Additionally, the stacking structure of the turbostratic multilayer graphene can decrease the effect of attachment of charge impurities and surface roughness. This paper explores the growth of high-purity and high quality turbostratic graphene with different interlayer spacings by calcining ferric chloride and sucrose at 1000 degrees C for 1 h under an argon atmosphere. X-ray diffraction patterns and Raman results imply that the turbostratic graphene contains two different interlayer spacings: 3.435 and 3.55 angstrom. The 3.55 angstrom turbostratic graphene is on top of the 3.435 angstrom turbostratic graphene, and there is an AB stacking pattern between the topmost graphene layer of 3.435 angstrom turbostratic graphene and the first graphene layer of the 3.55 angstrom turbostratic graphene, with an interlayer spacing of 3.35 angstrom. The two different interlayer spacings of turbostratic graphene arise from different cooling rates between the higher temperature ranges (>700 degrees C) and lower temperatures (<700 degrees C).