• 文献标题:   Focusing RKKY interaction by graphene P-N junction
  • 文献类型:   Article
  • 作  者:   ZHANG SH, ZHU JJ, YANG W, CHANG K
  • 作者关键词:   negative refraction, rkky interaction, pn junction, symmetryprotected enhancement
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:   Beijing Computat Sci Res Ctr
  • 被引频次:   10
  • DOI:   10.1088/2053-1583/aa76d2
  • 出版年:   2017

▎ 摘  要

The carrier-mediated RKKY interaction between local spins plays an important role for the application of magnetically doped graphene in spintronics and quantum computation. Previous studies largely concentrate on the influence of electronic states of uniform systems on the RKKY interaction. Here we reveal a very different way to manipulate the RKKY interaction by showing that the anomalous focusing-a well-known electron optics phenomenon in graphene P-N junctions-can be utilized to refocus the massless Dirac electrons emanating from one local spin to the other local spin. This gives rise to rich spatial interference patterns and symmetry-protected non-oscillatory RKKY interaction with a strongly enhanced magnitude. It may provide a new way to engineer the long-range spin-spin interaction in graphene.