• 文献标题:   Engineering a Robust Quantum Spin Hall State in Graphene via Adatom Deposition
  • 文献类型:   Article
  • 作  者:   WEEKS C, HU J, ALICEA J, FRANZ M, WU RQ
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW X
  • ISSN:   2160-3308
  • 通讯作者地址:   Univ British Columbia
  • 被引频次:   309
  • DOI:   10.1103/PhysRevX.1.021001
  • 出版年:   2011

▎ 摘  要

The 2007 discovery of quantized conductance in HgTe quantum wells delivered the field of topological insulators (TIs) its first experimental confirmation. While many three-dimensional TIs have since been identified, HgTe remains the only known two-dimensional system in this class. Difficulty fabricating HgTe quantum wells has, moreover, hampered their widespread use. With the goal of breaking this logjam, we provide a blueprint for stabilizing a robust TI state in a more readily available two-dimensional material-graphene. Using symmetry arguments, density functional theory, and tight-binding simulations, we predict that graphene endowed with certain heavy adatoms realizes a TI with substantial band gap. For indium and thallium, our most promising adatom candidates, a modest 6% coverage produces an estimated gap near 80 K and 240 K, respectively, which should be detectable in transport or spectroscopic measurements. Engineering such a robust topological phase in graphene could pave the way for a new generation of devices for spintronics, ultra-low-dissipation electronics, and quantum information processing.