• 文献标题:   Improved Quality of Graphene in the Absence of Hydrogen in a Low-Temperature Growth Process Using an Alcohol Precursor
  • 文献类型:   Article
  • 作  者:   CHOI K, LEE K, JEONG J, YE JP
  • 作者关键词:   graphene, chemicalvapor deposition, hydrogen flow rate, oxygen adsorption, methanol, ethanol
  • 出版物名称:   JOURNAL OF THE KOREAN PHYSICAL SOCIETY
  • ISSN:   0374-4884 EI 1976-8524
  • 通讯作者地址:   Inha Univ
  • 被引频次:   1
  • DOI:   10.3938/jkps.70.528
  • 出版年:   2017

▎ 摘  要

We present the results of low-temperature growth of graphene on polycrystalline copper foil surfaces at 800 degrees C by using low-pressure chemical-vapor deposition of alcohol precursors. The structural quality of the graphene sample was found to depend significantly on the ambient conditions during the annealing and the growth processes. The improved quality of graphene grown in an oxidizing environment was found to be associated with a lower nucleation density, suggesting that chemisorbed oxygen atoms play a critical role in determining the quality of graphene.