▎ 摘　　要

The article presents comparison of structural and electrical properties of fluorinated graphene (FG), graphene oxide (GO), and graphene films functionalized with N-methylpyrrolidone (G-NMP). The obtained functionalized graphene films were continuous, having no ruptures, their thickness was 20-50 nm. Fluorinated films are formed from fluorinated areas and corrugated graphene islets. The size and shape of microstructures on G-NMP surfaces depend on the duration of NMP treatment. GO films demonstrate a rippled surface morphology. The resistance of all films of functionalized graphene exceeds that of pristine graphene films (several kilohms). GO and FG films exhibit dielectric properties. Current-voltage characteristics of FG demonstrate two features: stepwise current increase and negative differential resistance (NDR). Functionalized graphene can be used in flexible electronics, particularly in planar printing technologies.