• 文献标题:   Engineering Electronic Properties of Graphene by Coupling with Si-Rich, Two-Dimensional Islands
  • 文献类型:   Article
  • 作  者:   LEE DH, YI J, LEE JM, LEE SJ, DOH YJ, JEONG HY, LEE Z, PAIK U, ROGERS JA, IL PARK W
  • 作者关键词:   graphene, silicon island, van der waals growth, bandgap engineering, sublattice asymmetry
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Ulsan Natl Inst Sci Technol
  • 被引频次:   24
  • DOI:   10.1021/nn304007x
  • 出版年:   2013

▎ 摘  要

Recent theoretical and experimental studies demonstrated that breaking of the sublattice symmetry in graphene produces an energy gap at the former Dirac point. We describe the synthesis of graphene sheets decorated with ultrathin, Si-rich two-dimensional (2D) islands (i.e., Gr:Si sheets), in which the electronic property of graphene is modulated by coupling with the Si-islands. Analyses based on transmission electron microscopy, atomic force microscopy, and electron and optical spectroscopies confirmed that Si-islands with thicknesses of similar to 2 to 4 nm and a lateral size of several tens of nm were bonded to graphene via van der Waals interactions. Field-effect transistors (FETs) based on Gr:Si sheets exhibited enhanced transconductance and maximum-to-minimum current level compared to bare-graphene FETs, and their magnitudes gradually increased with increasing coverage of Si layers on the graphene. The temperature dependent current voltage measurements of the Gr:Si sheet showed approximately a 2-fold increase in the resistance by decreasing the temperature from 250 to 10K, which confirmed the opening of the substantial bandgap (similar to 2.5-3.2 meV) in graphene by coupling with Si Islands.