▎ 摘　　要

The influence of graphene deposition on emission spectrum of Cu electrodes was investigated. In this order the two types of samples were prepared: one from a pure copper plate, and one from a copper plate covered with graphene. The graphene has been obtained using Chemical Vapor Deposition (CVD) method. The analysis of I=f(E) and Fowler-Nordheim (F-N) characteristics showed that a graphene layer uniformly deposited on a cathode, parallel to its surface creates a shielding for microprotrusions which causes a decrease of electric field and, consequently, the beta coefficient. This occurs regardless whether the sample surface had been etched before graphene deposition or not. The F-N characteristics showed that the cathode emission mechanism is changing with the increase of field intensity. Initially, the emission current is blocked by a surface adsorption layer. With further increase of the field intensity, up the E-th value, a typical F-N mechanism occurs until microdischarges appear. As a result of microdischarges, under the influence of cathode potential, electrons are emitted, which bombard the anode. This current has a form of pulses repeated approximately every 4.5 ns until plasma is created on anode, what is in fact equivalent to a breakdown.