• 文献标题:   Phase shifting mask modulated laser patterning on graphene
  • 文献类型:   Article
  • 作  者:   GAO F, LIU FY, YE ZR, SUI CH, YAN B, CAI PG, LV B, LI Y, CHEN NB, ZHENG YD, SHI Y
  • 作者关键词:   monolayer graphene, phase shifting mask, laser patterning
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Zhejiang Univ Technol
  • 被引频次:   1
  • DOI:   10.1088/1361-6528/28/4/045304
  • 出版年:   2017

▎ 摘  要

A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.