• 文献标题:   Photooxidative Resistance of Polytetrafluoroethylene-Graphene Nanocomposites to Vacuum Ultraviolet Radiation
  • 文献类型:   Article
  • 作  者:   VASILETS VN, SHULGA YM, KABACHKOV EN, MELEZHIK AV, TKACHEV AG
  • 作者关键词:   fewlayer graphene nanoplate, olytetrafluoroethylene, vacuum ultraviolet radiation, ir spectroscopy, xray photoelectron spectroscopy, contact angle
  • 出版物名称:   HIGH ENERGY CHEMISTRY
  • ISSN:   0018-1439 EI 1608-3148
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1134/S0018143921040147
  • 出版年:   2021

▎ 摘  要

The process of photooxidation of polytetrafluoroethylene composites with graphene by irradiation with monochromatic vacuum ultraviolet light at a wavelength of 123.6 nm from a resonant krypton lamp in the presence of air has been investigated by IR spectroscopy, X-ray photoelectron spectroscopy, and contact angle measurement. It has been shown that the introduction of small additives of graphene (1-10 wt%) into the polytetrafluoroethylene matrix leads to a significant decrease in the rate of the photodegradation process and, as a consequence, to improvement in the performance characteristics of the polymer under photooxidation conditions.