• 文献标题:   Dual-Gate Graphene FETs With f(T) of 50 GHz
  • 文献类型:   Article
  • 作  者:   LIN YM, CHIU HY, JENKINS KA, FARMER DB, AVOURIS P, VALDESGARCIA A
  • 作者关键词:   access resistance, dual gate, fieldeffect transistor fet, graphene, radio frequency rf
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   IBM TJ Watson Res Ctr
  • 被引频次:   105
  • DOI:   10.1109/LED.2009.2034876
  • 出版年:   2010

▎ 摘  要

A dual-gate graphene field-effect transistor is presented, which shows improved radio-frequency (RF) performance by reducing the access resistance using electrostatic doping. With a carrier mobility of 2700 cm(2)/V . s, a cutoff frequency of 50 GHz is demonstrated in a 350-nm-gate-length device. This f(T) value is the highest frequency reported to date for any graphene transistor, and it also exceeds that of Si MOS field-effect transistors at the same gate length, illustrating the potential of graphene for RF applications.