• 文献标题:   Electron-phonon coupling and intrinsic bandgap in highly-screened graphene
  • 文献类型:   Article
  • 作  者:   SIEGEL DA, HWANG CY, FEDOROV AV, LANZARA A
  • 作者关键词:  
  • 出版物名称:   NEW JOURNAL OF PHYSICS
  • ISSN:   1367-2630
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   31
  • DOI:   10.1088/1367-2630/14/9/095006
  • 出版年:   2012

▎ 摘  要

Photoemission studies of graphene have resulted in a long-standing controversy concerning the strength of the experimental electron-phonon (el-ph) interaction in comparison with theoretical calculations. Using high-resolution angle-resolved photoemission spectroscopy we study graphene grown on a copper substrate, where the metallic screening of the substrate substantially reduces the electron-electron interaction, simplifying the comparison of the el-ph interaction between theory and experiment. By taking the nonlinear bare bandstructure into account, we are able to show that the strength of the el-ph interaction shows better agreement with theoretical calculations. In addition, we observe a significant bandgap at the Dirac point of graphene.