• 文献标题:   Reduced Holey Graphene Oxide Membranes for Desalination with Improved Water Permeance
  • 文献类型:   Article
  • 作  者:   CHEN XY, FENG ZH, GOHIL J, STAFFORD CM, DAI N, HUANG L, LIN HQ
  • 作者关键词:   holey graphene oxide, membrane, etching by h2o2, reduction by hi, desalination
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244 EI 1944-8252
  • 通讯作者地址:   SUNY Buffalo
  • 被引频次:   5
  • DOI:   10.1021/acsami.9b19255
  • 出版年:   2020

▎ 摘  要

Reduced graphene oxide (r-GO) membranes with narrow channels exhibit salt rejections comparable to conventional nanofiltration (NF) membranes. However, their water permeances are much lower because of the high tortuosity for water permeation. Herein, we report a facile solution-processable approach to create in-plane nanopores on GO nanosheets before reduction, dramatically decreasing the tortuosity and increasing water permeance while retaining the salt rejection. Specifically, holey GO (HGO) nanosheets were prepared via chemical etching using hydrogen peroxide followed by the deposition on a porous support by vacuum filtration and then reduction via exposure to hydriodic acid solutions to generate the reduced HGO (r-HGO) membrane. The generation of nanopores increases the water permeance from 0.4 L m(-2) h(-1) bar(-1) (LMH/bar) to 6.6 LMH/bar with Na2SO4 rejection greater than 98.5%, and the membranes were robust under strong cross-flow shearing force for 36 h. Both water permeance and Na2SO4 rejection of these r-HGO membranes for the first time simultaneously reach the level of the commercial polyamide-based NF membranes. Given their good antibacterial properties and resistance to aggressive chemical washing, the r-HGO membranes show promise as next-generation NF membranes for desalination.