• 文献标题:   Boosting Carrier Mobility of Synthetic Few Layer Graphene on SiO2 by Interlayer Rotation and Decoupling
  • 文献类型:   Article
  • 作  者:   WU XY, CHUANG YT, CONTINO A, SOREE B, BREMS S, TOKEI Z, HEYNS M, HUYGHEBAERT C, ASSELBERGHS I
  • 作者关键词:   carrier mobility, interlayer coupling, raman, twisted graphene
  • 出版物名称:   ADVANCED MATERIALS INTERFACES
  • ISSN:   2196-7350
  • 通讯作者地址:   Katholieke Univ Leuven
  • 被引频次:   3
  • DOI:   10.1002/admi.201800454
  • 出版年:   2018

▎ 摘  要

The role of interlayer rotation on the electrical transport of few layer graphene (FLG) is rarely considered. In this paper, the impact of twisting angle on physical and electrical properties of synthetic single crystal bilayer and few layer graphene deposited on thermal SiO2 substrate is systematically studied. Bernal AB-stacked graphene layers show low carrier mobility due to strong interlayer coupling and substrate scattering. A dramatic increase in carrier mobility and conductivity is observed when the graphene layers are twisted. A field effect mobility up to 15000 cm(2) V-1 s(-1) and 460 nm mean free path is measured on a twisted three-layer graphene at room temperature is among the highest for graphene transferred to SiO2. In average, twisted graphene shows a fivefold improvement compared to AB stacked graphene in terms of mobility and conductivity, regardless of twist angles.