• 文献标题:   Cellular Oxidative Stress Response to Graphene Oxide Films Functionalized by NH3 Plasma
  • 文献类型:   Article
  • 作  者:   YOON OJ, SON YM, HWANG BU, SOHN IY, LEE NE
  • 作者关键词:   graphene oxide, nh3 plasma treatment, cell proliferation, cell viability, ros generation
  • 出版物名称:   JOURNAL OF NANOSCIENCE NANOTECHNOLOGY
  • ISSN:   1533-4880 EI 1533-4899
  • 通讯作者地址:   Sungkyunkwan Univ SKKU
  • 被引频次:   3
  • DOI:   10.1166/jnn.2017.15176
  • 出版年:   2017

▎ 摘  要

Functionalization of graphene oxide (GO) films was performed for the enhancement of bioaffinity by NH3 plasma treatment. Our results demonstrated that the damage free treatments caused a significant change in the surface charge states from negatively charged states with oxygen containing groups on the pristine GO to positively charged states with amine groups on the functionalized GO (f-GO) films. The effects of the conversion of the surface charge states of GO on bioaffinity and biocompatibility were investigated through studies of the reactive oxygen species (ROS) generation mitochondrial morphology and cell proliferation and viability during the growth of HeLa cells on GO and f-GO films. The proliferation and viability of HeLa cells on GO and f-GO films were enhanced compared to those of the control cells. Also the ROS generation on the f-GO (20s treatment) films compared to the other films was reduced. The different physicochemical properties of f-GO induced by plasma-chemical functionalization had a decisive influence on the ROS generation and the proliferation and viability of cells.