• 文献标题:   Ge-intercalated graphene: The origin of the p-type to n-type transition
  • 文献类型:   Article
  • 作  者:   KALONI TP, KAHALY MU, CHENG YC, SCHWINGENSCHLOGL U
  • 作者关键词:  
  • 出版物名称:   EPL
  • ISSN:   0295-5075
  • 通讯作者地址:   KAUST
  • 被引频次:   9
  • DOI:   10.1209/0295-5075/99/57002
  • 出版年:   2012

▎ 摘  要

Recently huge interest has been focussed on Ge-intercalated graphene. In order to address the effect of Ge on the electronic structure, we study Ge-intercalated free-standing C-6 and C-8 bilayer graphene, bulk C6Ge and C8Ge, as well as Ge-intercalated graphene on a SiC(0001) substrate, by density functional theory. In the presence of SiC(0001), there are three ways to obtain n-type graphene: i) intercalation between C layers; ii) intercalation at the interface to the substrate in combination with Ge deposition on the surface; and iii) cluster intercalation. All other configurations under study result in p-type states irrespective of the Ge coverage. We explain the origin of the different doping states and establish the conditions under which a transition occurs. Copyright (c) EPLA, 2012