• 文献标题:   Few-Layer Graphene Characterization by Near-Field Scanning Microwave Microscopy
  • 文献类型:   Article
  • 作  者:   TALANOV VV, DEL BARGA C, WICKEY L, KALICHAVA I, GONZALES E, SHANER EA, GIN AV, KALUGIN NG
  • 作者关键词:   graphene, nearfield microwave microscopy, impedance
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Neocera LLC
  • 被引频次:   28
  • DOI:   10.1021/nn100493f
  • 出版年:   2010

▎ 摘  要

Near-field scanning microwave microscopy is employed for quantitative imaging at 4 GHz of the local impedance for monolayer and few-layer graphene. The microwave response of graphene is found to be thickness dependent and determined by the local sheet resistance of the graphene flake. Calibration of the measurement system and knowledge of the probe geometry allows evaluation of the AC impedance for monolayer and few-layer graphene, which is found to be predominantly active. The use of localized evanescent electromagnetic field in our experiment provides a promising tool for investigations of plasma waves in graphene with wave numbers determined by the spatial spectrum of the near-field. By using near-field microwave microscopy one can perform simultaneous imaging of location, geometry, thickness, and distribution of electrical properties of graphene without a need for device fabrication.