• 文献标题:   High-mobility junction field-effect transistor via graphene/MoS2 heterointerface
  • 文献类型:   Article
  • 作  者:   KIM T, FAN S, LEE S, JOO MK, LEE YH
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   Sungkyunkwan Univ
  • 被引频次:   0
  • DOI:   10.1038/s41598-020-70038-6
  • 出版年:   2020

▎ 摘  要

Monolayer molybdenum disulfide (MoS2) possesses a desirable direct bandgap with moderate carrier mobility, whereas graphene (Gr) exhibits a zero bandgap and excellent carrier mobility. Numerous approaches have been suggested for concomitantly realizing high on/off current ratio and high carrier mobility in field-effect transistors, but little is known to date about the effect of two-dimensional layered materials. Herein, we propose a Gr/MoS2 heterojunction platform, i.e., junction field-effect transistor (JFET), that enhances the carrier mobility by a factor of similar to 10 (similar to 100 cm(2) V-1 s(-1)) compared to that of monolayer MoS2, while retaining a high on/off current ratio of similar to 10(8) at room temperature. The Fermi level of Gr can be tuned by the wide back-gate bias (V-BG) to modulate the effective Schottky barrier height (SBH) at the Gr/MoS2 heterointerface from 528 meV (n-MoS2/p-Gr) to 116 meV (n-MoS2/n-Gr), consequently enhancing the carrier mobility. The double humps in the transconductance derivative profile clearly reveal the carrier transport mechanism of Gr/MoS2, where the barrier height is controlled by electrostatic doping.