• 文献标题:   Leveraging negative capacitance ferroelectric materials for performance boosting of sub-10 nm graphene nanoribbon field-effect transistors: a quantum simulation study
  • 文献类型:   Article
  • 作  者:   TAMERSIT K, MOAIYERI MH, JOOQ MKQ
  • 作者关键词:   graphene nanoribbon gnr, fieldeffect transistors fets, metalferroelectricmetalinsulatorsemiconductor mfmis, negative capacitance nc, subthreshold swing ss, quantum simulation, switching
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1088/1361-6528/ac8883
  • 出版年:   2022

▎ 摘  要

In this paper, an ultrascaled ballistic graphene nanoribbon field-effect transistor (GNRFET) endowed with a compound double-gate based on metal-ferroelectric-metal (MFM) structure is proposed to overcome the limitations encountered with its conventional counterpart. The ballistic transistor is computationally investigated by solving self-consistently the non-equilibrium Green's function formalism and the Poisson solver in conjunction with the Landau-Khalatnikov equation. The numerical investigation has included the ferroelectric-induced amplified internal metal voltage, the role of the ferroelectric thickness in boosting the device performance, the assessment of the switching and subthreshold performance, and the analysis of the FE-GNRFET scaling capability. The simulations revealed that the MFM-based gate can significantly boost the performance of GNRFETs, including the switching behavior, the on-current, the off-current, the current ratio, the swing factor, the intrinsic delay, and the scaling capability. More importantly, the proposed MFM GNRFET was found able to provide sub-thermionic subthreshold swing even with sub-10 nm gate lengths, which is very promising for low-power applications. The obtained results indicate that the MFM-based gating approach can give new impulses to the GNRFET technology.