▎ 摘　　要

We demonstrated a novel fluorination process of graphene using Ar/F-2 plasma. We carried out characterization of the plasma-processed graphene with Raman spectroscopy. In addition, it was found that the proposed "face-down'' technique using Ar/F-2 plasma was a low-damage fluorination process. We believe that the proposed technique using Ar/F-2 plasma is very useful for the fluorination of graphene films by optimizing the process conditions for electronic and optical device applications. (c) 2013 The Japan Society of Applied Physics