• 文献标题:   Synthesis of Isotopically-Labeled Graphite Films by Cold-Wall Chemical Vapor Deposition and Electronic Properties of Graphene Obtained from Such Films
  • 文献类型:   Article
  • 作  者:   CAI WW, PINER RD, ZHU YW, LI XS, TAN ZB, FLORESCA HC, YANG CL, LU L, KIM MJ, RUOFF RS
  • 作者关键词:   chemical vapor deposition cvd, isotopicallylabeled graphite, graphene
  • 出版物名称:   NANO RESEARCH
  • ISSN:   1998-0124 EI 1998-0000
  • 通讯作者地址:   Univ Texas Austin
  • 被引频次:   35
  • DOI:   10.1007/s12274-009-9083-y
  • 出版年:   2009

▎ 摘  要

We report the synthesis of isotopically-labeled graphite films on nickel substrates by using cold-wall chemical vapor deposition (CVD). During the synthesis, carbon from C-12- and C-13-methane was deposited on, and dissolved in, a nickel foil at high temperature, and a uniform graphite film was segregated from the nickel surface by cooling the sample to room temperature. Scanning and transmission electron microscopy, micro-Raman spectroscopy, and X-ray diffraction prove the presence of a graphite film. Monolayer graphene films obtained from such isotopically-labeled graphite films by mechanical methods have electron mobility values greater than 5000 cm(2) . V-1 . s(-1) at low temperatures. Furthermore, such films exhibit the half-integer quantum Hall effect over a wide temperature range from 2 K to 200 K, implying that the graphite grown by this cold-wall CVD approach has a quality as high as highly oriented pyrolytic graphite (HOPG). The results from transport measurements indicate that C-13-labeling does not significantly affect the electrical transport properties of graphene.