• 文献标题:   Origin of Doping in Quasi-Free-Standing Graphene on Silicon Carbide
  • 文献类型:   Article
  • 作  者:   RISTEIN J, MAMMADOV S, SEYLLER T
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW LETTERS
  • ISSN:   0031-9007
  • 通讯作者地址:   Univ Erlangen Nurnberg
  • 被引频次:   129
  • DOI:   10.1103/PhysRevLett.108.246104
  • 出版年:   2012

▎ 摘  要

We explain the robust p-type doping observed for quasi-free-standing graphene on hexagonal silicon carbide by the spontaneous polarization of the substrate. This mechanism is based on a bulk property of SiC, unavoidable for any hexagonal polytype of the material and independent of any details of the interface formation. We show that sign and magnitude of the polarization are in perfect agreement with the doping level observed in the graphene layer. With this mechanism, models based on hypothetical acceptor-type defects as they are discussed so far are obsolete. The n-type doping of epitaxial graphene is explained conventionally by donorlike states associated with the buffer layer and its interface to the substrate that overcompensate the polarization doping.