▎ 摘　　要

We demonstrate the deposition of crystalline palladium nanoparticles on graphene nanoplatelets (Pd/graphene) via atmospheric pressure atomic layer deposition (ALD) carried out in a fluidized bed reactor. The nucleation and growth of Pd nanoparticles on the inert graphene surface was enabled by applying an ozone pretreatment step, without significantly affecting the graphene crystalline structure. Uniform nucleation on both basal planes and edges of the graphene was obtained. The Pd loading and dispersion as well as the average particle size could be controlled by varying the number of ALD cycles. By analyzing the evolution of the particle size distribution and spatial density, we obtained insights into the nucleation and growth of Pd ALD on graphene. Furthermore, by shortening the pretreatment time, selective growth of Pd nanoparticles on the edges of the graphene was achieved. The Pd/graphene fabricated with our method showed a significantly lower level of impurities compared to the Pd/graphene synthesized by wet chemistry routes. Our approach provides a 100% solvent-free, controllable and scalable process for producing the bulk quantities of Pd/graphene required for practical applications in, for example, catalysis.