• 文献标题:   Correlation between Chemical Dopants and Topological Defects in Catalytically Active Nanoporous Graphene
  • 文献类型:   Article
  • 作  者:   ITO Y, SHEN YH, HOJO D, ITAGAKI Y, FUJITA T, CHEN LH, AIDA T, TANG Z, ADSCHIRI T, CHEN MW
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   Tohoku Univ
  • 被引频次:   38
  • DOI:   10.1002/adma.201604318
  • 出版年:   2016

▎ 摘  要

The interplay between chemical dopants and topological defects plays a crucial role in electrocatalysis of doped graphene. By systematically tuning the curvatures, thereby the density of topological defects, of 3D nanoporous graphene, the intrinsic correlation of topological defects with chemical doping contents and dopant configurations is revealed, shining lights into the structural and chemical origins of HER activities of graphene.