• 文献标题:   Formation of a Buffer Layer for Graphene on C-Face SiC{0001}
  • 文献类型:   Article
  • 作  者:   HE GW, SRIVASTAVA N, FEENSTRA RM
  • 作者关键词:   thermal conductivity, thermoelectric, interface, layered oxide, molecular dynamic, phonon, cobaltite
  • 出版物名称:   JOURNAL OF ELECTRONIC MATERIALS
  • ISSN:   0361-5235 EI 1543-186X
  • 通讯作者地址:   Carnegie Mellon Univ
  • 被引频次:   3
  • DOI:   10.1007/s11664-013-2901-8
  • 出版年:   2014

▎ 摘  要

Graphene films prepared by heating the SiC surface (the C-face of the {0001} surface) in a Si-rich environment have been studied using low-energy electron diffraction (LEED) and low-energy electron microscopy. Upon graphitization, an interface with symmetry is observed by in situ LEED. After oxidation, the interface displays symmetry. Electron reflectivity measurements indicate that these interface structures arise from a graphene-like "buffer layer" that forms between the graphene and the SiC, similar to that observed on Si-face SiC. From a dynamical LEED structure calculation for the oxidized C-face surface, it is found to consist of a graphene layer sitting on top of a silicate (Si2O3) layer, with the silicate layer having the well-known structure as previously studied on bare SiC surfaces. Based on this result, the structure of the interface prior to oxidation is discussed.