• 文献标题:   Complete Corrosion Inhibition through Graphene Defect Passivation
  • 文献类型:   Article
  • 作  者:   HSIEH YP, HOFMANN M, CHANG KW, JHU JG, LI YY, CHEN KY, YANG CC, CHANG WS, CHEN LC
  • 作者关键词:   graphene, electrochemistry, defect, corrosion inhibition, passivation
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Natl Chung Cheng Univ
  • 被引频次:   105
  • DOI:   10.1021/nn404756q
  • 出版年:   2014

▎ 摘  要

Graphene is expected to enable superior corrosion protection due to its impermeability and chemical inertness. Previous reports, however, demonstrate limited corrosion inhibition and even corrosion enhancement of graphene on metal surfaces. To enable the reliable and complete passivation, the origin of the low inhibition efficiency of graphene was investigated. Combining electrochemical and morphological characterization techniques, nanometer-sized structural defects in chemical vapor deposition grown graphene were found to be the cause for the limited passivation effect. Extremely fast mass transport on the order of meters per second both across and parallel to graphene layers results in an inhibition efficiency of only similar to 50% for Cu covered with up to three graphene layers. Through selective passivation of the defects by atomic layer deposition (AID) an enhanced corrosion protection of more than 99% was achieved, which compares favorably with commercial corrosion protection methods.