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  • 文献标题:   Finding optimal HBr reduction of inkjet printed graphene oxide for flexible electronics
  • 文献类型:   Article
  • 作　　者:   WLASNY I, ROGALA M, DABROWSKI P, KOWALCZYK PJ, BUSIAKIEWICZ A, KOZLOWSKI W, LIPINSKA L, JAGIELLO J, AKSIENIONEK M, SIERADZKI Z, KRUCINSKA I, PUCHALSKI M, SKRZETUSKA E, DRACZYNSKI Z, KLUSEK Z
  • 作者关键词:   organic compound, heat treatment, atomic force microscopy, xray photoemission spectroscopy
  • 出版物名称:   MATERIALS CHEMISTRY PHYSICS
  • ISSN:   0254-0584 EI 1879-3312
  • 通讯作者地址:   Univ Warsaw
  • 被引频次:   5
  • DOI:   10.1016/j.matchemphys.2016.06.076
  • 出版年:   2016

▎ 摘　　要

In this article we present the results of our investigations of reduction of graphene oxide overprints, deposited by ink-jet method, by hydrobromic acid. Our study presents impact of different parameters of reduction, such as a temperature and time of the process on the chemical composition and electrical conductivity of the resulting material - reduced graphene oxide. Our results show the outstanding potential of this method for use in the production of flexible and elastic electronics and indicate the optimal parameters of reduction, which allow producing the optimal product. (C) 2016 Elsevier B.V. All rights reserved.