• 文献标题:   Band Gap Opening of Bilayer Graphene by F4-TCNQ Molecular Doping and Externally Applied Electric Field
  • 文献类型:   Article
  • 作  者:   TIAN XQ, XU JB, WANG XM
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY B
  • ISSN:   1520-6106
  • 通讯作者地址:   Chinese Univ Hong Kong
  • 被引频次:   74
  • DOI:   10.1021/jp102800v
  • 出版年:   2010

▎ 摘  要

The band gap opening of bilayer graphene with one side surface adsorption of F4-TCNQ is reported. F4-TCNQ doped bilayer graphene shows p-type semiconductor characteristics. With a F4-TCNQ concentration of 1.3 x 10(-10) mol/cm(2), the charge transfer between each F4-TCNQ molecule and graphene is 0.45e, and the built-in electric field, E-bi, between the graphene layers could reach 0.070 V/angstrom. The charge transfer and band gap opening of the F4-TCNQ-doped graphene can be further modulated by an externally applied electric field (E-ext). At 0.077 V/angstrom, the gap opening at the Dirac point (K), Delta E-K = 306 meV, and the band gap, E-g = 253 meV, are around 71% and 49% larger than those of the pristine bilayer under the same E-ext.