• 文献标题:   Role of plasma-induced defects in the generation of 1/f noise in graphene
  • 文献类型:   Article
  • 作  者:   CULTRERA A, CALLEGARO L, MARZANO M, ORTOLANO M, AMATO G
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   INRIM Ist Nazl Ric Metrol
  • 被引频次:   1
  • DOI:   10.1063/1.5024218
  • 出版年:   2018

▎ 摘  要

It has already been reported that 1/f noise in graphene can be dominated by fluctuations of charge carrier mobility. We show here that the increasing damage induced by oxygen plasma on graphene samples result in two trends: at low doses, the magnitude of the 1/f noise increases with the dose; and at high doses, it decreases with the dose. This behaviour is interpreted in the framework of 1/f noise generated by carrier mobility fluctuations where the concentration of mobility fluctuation centers and the mean free path of the carriers are competing factors. Published by AIP Publishing.