• 文献标题:   Top-Gated Graphene Field-Effect Transistors Using Graphene on Si (111) Wafers
  • 文献类型:   Article
  • 作  者:   MOON JS, CURTIS D, BUI S, MARSHALL T, WHEELER D, VALLES I, KIM S, WANG E, WENG X, FANTON M
  • 作者关键词:   fieldeffect mobility, fieldeffect transistor fet, graphene, nfet, pfet, si mosfet, soi mosfet
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106
  • 通讯作者地址:   HRL Labs LLC
  • 被引频次:   27
  • DOI:   10.1109/LED.2010.2065792
  • 出版年:   2010

▎ 摘  要

In this letter, we report the first experimental demonstration of wafer-scale ambipolar field-effect transistor (FET) on Si (111) substrates by synthesizing a graphene layer on top of 3C-SiC(111)/Si(111) substrates. With lateral scaling of the source-drain distance to 1 mu m in a top-gated layout, the ON-state current of 225 mu A/mu m and peak transconductance of > 40 mu S/mu m were obtained at Vds = 2 V, which is the highest performance of graphene-on-Si FETs. The peak field-effect mobilities of 285 cm(2)/Vs for holes and 175 cm(2)/Vs for electrons were demonstrated, which is higher than that of ultra-thin-body SOI (n, p) MOSFETs.