• 文献标题:   Subsurface and interface channeling of keV ions in graphene/SiC
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   ROSANDI Y, URBASSEK HM
  • 作者关键词:   graphene, silicon carbide, sputtering, defect formation, channeling
  • 出版物名称:   NUCLEAR INSTRUMENTS METHODS IN PHYSICS RESEARCH SECTION BBEAM INTERACTIONS WITH MATERIALS ATOMS
  • ISSN:   0168-583X EI 1872-9584
  • 通讯作者地址:   Univ Kaiserslautern
  • 被引频次:   2
  • DOI:   10.1016/j.nimb.2014.07.031
  • 出版年:   2014

▎ 摘  要

Using molecular-dynamics simulation, we study the impact of 3 keV Ar and Xe ions on a beta-SiC (111) surface covered by a single graphene layer. At glancing ion incidence angles, we observe the ions to undergo interface channeling between the graphene and the first SiC surface layer. This behavior is particularly pronounced for Xe ions, where at incidence angles of 70-75 degrees more than 50% of the ions are channeled. This process is accompanied by abundant damage production and sputtering in the graphene layer. Similarities and differences to subsurface channeling in elemental materials are discussed. (C) 2014 Elsevier B.V. All rights reserved.