• 文献标题:   Stress analysis of perforated graphene nano-electro-mechanical (NEM) contact switches by 3D finite element simulation
  • 文献类型:   Article
  • 作  者:   ZULKEFLI MA, MOHAMED MA, SIOW KS, MAJLIS BY, KULOTHUNGAN J, MURUGANATHAN M, MIZUTA H
  • 作者关键词:  
  • 出版物名称:   MICROSYSTEM TECHNOLOGIESMICROAND NANOSYSTEMSINFORMATION STORAGE PROCESSING SYSTEMS
  • ISSN:   0946-7076 EI 1432-1858
  • 通讯作者地址:   Univ Kebangsaan Malaysia
  • 被引频次:   2
  • DOI:   10.1007/s00542-017-3483-9
  • 出版年:   2018

▎ 摘  要

In this article, we report the finite element method (FEM) simulation of the suspended double-clamped graphene beam-based NEM switches with standard and perforated beam structures, to analyze the von Mises stress, the contour plot and the electrical field distribution by using FEM simulator provided by IntelliSuite and COMSOL software. This FEM numerical model is used to observe the scaling characteristics of the graphene beam-based NEM switch. The FEM results confirm that the von Mises stress value reduced by similar to 2-3% for every 0.1 A mu m increment of the standard graphene beam length. The introduction of perforation in the case of HL = 150 nm, HW = 100 nm and DL = 100 nm, further reduced the von Mises stress at the graphene beam end and the beam center by approximately similar to 20-35 and similar to 10-20%, respectively. These low values of von Mises stress along the graphene beam resulted in a lower probability of the device failure. In addition, the strong electrostatic force at the hole's edges and beam's edges leads to a larger mechanical deflection at the edges compared to the beam center and it is consistent with the analysis of von Mises stress. The results presented here are expected to accelerate developments in the working dimension and parameter of the graphene NEM switch device fabrication for better mechanical reliability operation.