• 文献标题:   Substrate orientation: A way towards higher quality monolayer graphene growth on 6H-SiC(0001)
  • 文献类型:   Article
  • 作  者:   VIROJANADARA C, YAKIMOVA R, OSIECKI JR, SYVAJARVI M, UHRBERG RIG, JOHANSSON LI, ZAKHAROV AA
  • 作者关键词:   graphene, silicon carbide, carbon, lowenergy electron microscopy leem, lowenergy electron diffraction leed, scanning tunneling microscopy stm
  • 出版物名称:   SURFACE SCIENCE
  • ISSN:   0039-6028 EI 1879-2758
  • 通讯作者地址:   Linkoping Univ
  • 被引频次:   56
  • DOI:   10.1016/j.susc.2009.05.005
  • 出版年:   2009

▎ 摘  要

The influence of substrate orientation on the morphology of graphene growth on 6H-SiC(0 0 0 1) was investigated using low-energy electron and scanning tunneling microscopy (LEEM and STM). Large area monolayer graphene was successfully furnace-grown on these substrates. Larger terrace widths and smaller step heights were obtained on substrates with a smaller mis-orientation from on-axis (0.03 degrees) than on those with a larger (0.25 degrees). Two different types of a carbon atom networks, honeycomb and three-for-six arrangement, were atomically resolved in the graphene monolayer. These findings are of relevance for various potential applications based on graphene-SiC structures. (C) 2009 Elsevier B.V. All rights reserved.