▎ 摘　　要

The transparent graphene-like carbon (GLC) thin films were deposited on fluorine doped tin oxide (FM) glass substrates by hot filament chemical vapor deposition (HFCVD) without using any catalyst. The GLC thin film substrates presented reasonably low sheet resistance with good transparency. The thickness and transparency of GLC thin film substrates were easily controlled by varying the deposition time from 5-30 min at the constant filament temperature 1400 degrees C. The prepared GLC thin film substrates were directly used as conducting substrates to make TiO2 photoanode for the fabrication of dye sensitized solar cells (DSSCs). A solar-to-electrical conversion efficiency of similar to 6.94% was achieved by DSSC fabricated with GLC thin film substrate (10 min) which was reasonably higher than DSSC fabricated with bare FTO substrate. The deposition of GLC thin film on FTO significantly improved the open circuit voltage (V-OC, similar to 0.70 V) and fill factor (FF, similar to 0.63) of the fabricated DSSC. The enhanced V-OC and FF might attribute to the reduced recombination and improvement of contacts between TiO2 layer and the conducting layer. (C) 2013 Elsevier Ltd. All rights reserved.