• 文献标题:   Scan-Mode Atmospheric-Pressure Plasma Jet Processed Reduced Graphene Oxides for Quasi-Solid-State Gel-Electrolyte Supercapacitors
  • 文献类型:   Article
  • 作  者:   HSU AR, CHIEN HH, LIAO CY, LEE CC, TSAI JH, HSU CC, CHENG IC, CHEN JZ
  • 作者关键词:   atmospheric pressure plasma, reduced graphene oxide, supercapacitor
  • 出版物名称:   COATINGS
  • ISSN:   2079-6412
  • 通讯作者地址:   Natl Taiwan Univ
  • 被引频次:   3
  • DOI:   10.3390/coatings8020052
  • 出版年:   2018

▎ 摘  要

A scanning atmospheric-pressure plasma jet (APPJ) is essential for high-throughput large-area and roll-to-roll processes. In this study, we evaluate scan-mode APPJ for processing reduced graphene oxides (rGOs) that are used as the electrodes of quasi-solid-state gel-electrolyte supercapacitors. rGO nanoflakes are mixed with ethyl cellulose (EC) and terpineol to form pastes for screen-printing. After screen-printing the pastes on carbon cloth, a DC-pulse nitrogen APPJ is used to process the pastes in the scan mode. The maximal temperature attained is similar to 550 degrees C with a thermal influence duration of similar to 10 s per scan. The pastes are scanned by APPJ for 0, 1, 3 and 5 times. X-ray photoelectron spectroscopy (XPS) indicates the reduction of C-O binding content as the number of scan increases, suggesting the oxidation/decomposition of EC. The areal capacitance increases and then decreases as the number of scan increases; the best achieved areal capacitance is 15.93 mF/cm(2) with one APPJ scan, in comparison to 4.38 mF/cm(2) without APPJ processing. The capacitance retention rate of the supercapacitor with the best performance is similar to 93% after a 1000-cycle cyclic voltammetry (CV) test. The optimal number of APPJ scans should enable the proper removal of inactive EC and improved wettability while minimizing the damage caused to rGOs by nitrogen APPJ processing.