▎ 摘　　要

The properties of graphene nanoribbons are dependent on both the nanoribbon width and the crystallographic orientation of the edges. Scanning tunneling microscope lithography is a method which is able to create graphene nanoribbons with well defined edge orientation, having a width of a few nanometers. However, it has only been demonstrated on the top layer of graphite. In order to allow practical applications of this powerful lithography technique, it needs to be implemented on single layer graphene. We demonstrate the preparation of graphene nanoribbons with well defined crystallographic orientation on top of gold substrates. Our transfer and lithography approach brings one step closer the preparation of well defined graphene nanoribbons on arbitrary substrates for nanoelectronic applications. (C) 2013 Elsevier B.V. All rights reserved.