• 文献标题:   Magnetoresistance of Ultralow-Hole-Density Monolayer Epitaxial Graphene Grown on SiC
  • 文献类型:   Article
  • 作  者:   CHUANG CS, LIU CW, YANG YF, SYONG WR, LIANG CT, ELMQUIST RE
  • 作者关键词:   silicon carbide, epitaxial graphene, magnetoresistance, pmos, quantum hall, resistance standard
  • 出版物名称:   MATERIALS
  • ISSN:  
  • 通讯作者地址:   Chung Yuan Christian Univ
  • 被引频次:   0
  • DOI:   10.3390/ma12172696
  • 出版年:   2019

▎ 摘  要

Silicon carbide (SiC) has already found useful applications in high-power electronic devices and light-emitting diodes (LEDs). Interestingly, SiC is a suitable substrate for growing monolayer epitaxial graphene and GaN-based devices. Therefore, it provides the opportunity for integration of high-power devices, LEDs, atomically thin electronics, and high-frequency devices, all of which can be prepared on the same SiC substrate. In this paper, we concentrate on detailed measurements on ultralow-density p-type monolayer epitaxial graphene, which has yet to be extensively studied. The measured resistivity rho(xx) shows insulating behavior in the sense that rho(xx) decreases with increasing temperature T over a wide range of T (1.5 K = 120 K, the measured positive MR ratio [rho(xx)(B) - rho(xx)(B = 0)]/rho(xx)(B = 0) at B = 2 T decreases with increasing T, but the positive MR persists up to room temperature. Our experimental results suggest that the large MR ratio (similar to 100% at B = 9 T) is an intrinsic property of ultralow-charge-density graphene, regardless of the carrier type. This effect may find applications in magnetic sensors and magnetoresistance devices.