• 文献标题:   A growth mechanism for graphene deposited on polycrystalline Co film by plasma enhanced chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   WANG SM, QIAO L, ZHAO CM, ZHANG XM, CHEN JL, TIAN HW, ZHENG WT, HAN ZB
  • 作者关键词:  
  • 出版物名称:   NEW JOURNAL OF CHEMISTRY
  • ISSN:   1144-0546
  • 通讯作者地址:   Jilin Univ
  • 被引频次:   15
  • DOI:   10.1039/c3nj41136b
  • 出版年:   2013

▎ 摘  要

Graphene is deposited on polycrystalline Co film by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD), and the effect of deposition time on the crystallinity of graphene, such as graphitic degree and in-plane crystallite size, is explored. The findings are that graphene can be obtained on polycrystalline Co film for only 15 s, suggesting that a direct growth mechanism plays an important role in the formation of graphene. The first-principles density functional theory (DFT) results also reveal that the graphene is more easily formed on Co via a surface direct growth mechanism than that via a precipitation mechanism. Our studies are critical in guiding the graphene growth process as we try to achieve the highest quality graphene for electronic devices.