• 文献标题:   Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   OKIGAWA Y, TSUGAWA K, YAMADA T, ISHIHARA M, HASEGAWA M
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Natl Inst Adv Ind Sci Technol
  • 被引频次:   12
  • DOI:   10.1063/1.4825103
  • 出版年:   2013

▎ 摘  要

In this Letter, we discuss the results of Hall effect measurements to examine the electrical properties of the graphene films synthesized by low-temperature microwave plasma chemical vapor deposition. Van der Pauw devices with sizes of 50-100 lm were fabricated, for which we observed p-type conduction and mobility from 10 to 100 cm(2)/V s. To investigate the mobility dispersion, we performed Raman mapping to quantify the number of defects and the disorder in graphene films. The results suggest that the D-band/G-band intensity ratio is correlated with the mobility. Moreover, we discuss the factors controlling the mobility and how to improve the quality of the graphene films by reducing the number of defects. (C) 2013 AIP Publishing LLC.