• 文献标题:   Optimization of Substrate Temperature for Uniform Graphene Synthesis by Numerical Simulation and Machine Learning
  • 文献类型:   Article
  • 作  者:   DENG WF, HUANG YS
  • 作者关键词:   chemical vapor deposition, graphene, machine learning, optimization, simulation
  • 出版物名称:   CRYSTAL RESEARCH TECHNOLOGY
  • ISSN:   0232-1300 EI 1521-4079
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1002/crat.202100006 EA JUN 2021
  • 出版年:   2021

▎ 摘  要

High uniformity graphene has extensive application prospect in many important fields due to its excellent features. During large-area graphene synthesis by chemical vapor deposition, the optimization of the substrate temperature can improve the uniformity of graphene. Here, machine learning is used to design and optimize the substrate surface temperature for uniform graphene deposition. The computational fluid dynamics simulations based on a developed computational model are first performed to obtain the training data for machine learning, such as the gas temperature, velocity, concentrations, etc. Then, the neural network model is used to optimize the substrate temperature using the simulated data. It is found that the high accuracy is achieved through the validation of testing set. The optimal substrate temperature distribution is finally obtained, in which the carbon deposition rate and its uniformity are optimized to the specified values.