• 文献标题:   Optical Estimation of the Carrier Concentration and the Value of Strain in Monolayer Graphene Grown on 4H-SiC
  • 文献类型:   Article
  • 作  者:   ELISEYEV IA, DAVYDOV VY, SMIRNOV AN, NESTOKLON MO, DEMENTEV PA, LEBEDEV SP, LEBEDEV AA, ZUBOV AV, MATHEW S, PEZOLDT J, BOKAI KA, USACHOV DY
  • 作者关键词:   graphene, sublimation epitaxy, 4hsic, electron concentration, strain, raman spectroscopy, angleresolved photoemission spectroscopy, hall effect
  • 出版物名称:   SEMICONDUCTORS
  • ISSN:   1063-7826 EI 1090-6479
  • 通讯作者地址:   Ioffe Inst
  • 被引频次:   1
  • DOI:   10.1134/S1063782619140057
  • 出版年:   2019

▎ 摘  要

Systematic studies of the effect of the electron concentration on the Raman spectra of single-layer graphene films have been carried out. The samples were grown by thermal destruction of the Si-face of the 4H-SiC substrate. Analysis of the results led us to the conclusion that for the correct estimation of the electron concentration and strain values in graphene using Raman spectroscopy data it is necessary to take into account the value of the Fermi velocity in the graphene layer. This conclusion is valid for graphene on any other substrate as well, since the Fermi velocity in graphene depends on the dielectric constant of the substrate.