• 文献标题:   Limiting Size of Monolayer Graphene Flakes Grown on Silicon Carbide or via Chemical Vapor Deposition on Different Substrates
  • 文献类型:   Article
  • 作  者:   ALEKSEEV NI
  • 作者关键词:   graphene, epitaxial growth, chemical vapor deposition cvd, quantum chemistry, graphene synthesis on silicon carbide
  • 出版物名称:   RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY A
  • ISSN:   0036-0244 EI 1531-863X
  • 通讯作者地址:   St Petersburg Electrotech Univ LETI
  • 被引频次:   0
  • DOI:   10.1134/S0036024418050023
  • 出版年:   2018

▎ 摘  要

The maximum size of homogeneous monolayer graphene flakes that form during the high-temperature evaporation of silicon from a surface of SiC or during graphene synthesis via chemical vapor deposition is estimated, based on the theoretical calculations developed in this work. Conditions conducive to the fragmentation of a monolayer graphene sheet to form discrete fragments or terrace-type structures in which excess energy due to dangling bonds at the edges is compensated for by the lack of internal stress are indentified and described. The results from calculations for the sizes of graphene structures are compared with experimental findings for the most successful graphene syntheses reported in the literature.