• 文献标题:   Growth of atomically smooth MgO films on graphene by molecular beam epitaxy
  • 文献类型:   Article
  • 作  者:   WANG WH, HAN W, PI K, MCCREARY KM, MIAO F, BAO W, LAU CN, KAWAKAMI RK
  • 作者关键词:   insulating thin film, magnesium compound, molecular beam epitaxial growth, monolayer, surface diffusion, surface morphology, surface roughnes
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Calif Riverside
  • 被引频次:   43
  • DOI:   10.1063/1.3013820
  • 出版年:   2008

▎ 摘  要

We investigate the growth of MgO films on graphene by molecular beam epitaxy and find that surface diffusion promotes a rough morphology. To reduce the mobility of surface atoms, the graphene surface is dressed by Ti atoms prior to MgO deposition. With as little as 0.5 ML (monolayer) of Ti, the MgO overlayer becomes atomically smooth. Furthermore, no aggregation of MgO is observed at the edges of the graphene sheet. These results are important for the fabrication of nanoscale electronic and spintronic devices.