• 文献标题:   Low contact resistance in epitaxial graphene devices for quantum metrology
  • 文献类型:   Article
  • 作  者:   YAGER T, LARTSEV A, CEDERGREN K, YAKIMOVA R, PANCHAL V, KAZAKOVA O, TZALENCHUK A, KIM KH, PARK YW, LARAAVILA S, KUBATKIN S
  • 作者关键词:  
  • 出版物名称:   AIP ADVANCES
  • ISSN:   2158-3226
  • 通讯作者地址:   Chalmers Univ Technol
  • 被引频次:   10
  • DOI:   10.1063/1.4928653
  • 出版年:   2015

▎ 摘  要

We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Omega up to 11 k Omega. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (< 10 Omega) suitable for high precision quantum resistance metrology. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.