• 文献标题:   Plasma-based chemical modification of epitaxial graphene with oxygen functionalities
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   HERNANDEZ SC, WHEELER VD, OSOFSKY MS, JERNIGAN GG, NAGAREDDY V, NATH A, LOCK EH, NYAKITI LO, MYERSWARD RL, SRIDHARA K, HORSFALL AB, EDDY CR, GASKILL DK, WALTON SG
  • 作者关键词:   graphene, functionalization, plasma modification, hall effect, electrical characterization
  • 出版物名称:   SURFACE COATINGS TECHNOLOGY
  • ISSN:   0257-8972
  • 通讯作者地址:   US Navy
  • 被引频次:   14
  • DOI:   10.1016/j.surfcoat.2013.11.015
  • 出版年:   2014

▎ 摘  要

Epitaxial graphene is promising material for future graphene-based applications including high frequency devices and chemical/biological sensors. Modifying the surface chemistry of graphene allows one to control its properties and thus provides a promising route towards further broadening the device application space for this unique material. Herein, we demonstrate the use of electron beam generated plasmas as a route towards controlled oxygen doping of epitaxial graphene. X-ray photoelectron spectroscopy, Raman spectroscopy and electrical measurements are used to track the oxygen incorporation and its influence on the structural and electrical properties of epitaxial graphene. (C) 2013 Elsevier B.V. All rights reserved.