• 文献标题:   The integration of graphene into microelectronic devices
  • 文献类型:   Review
  • 作  者:   RUHL G, WITTMANN S, KOENIG M, NEUMAIER D
  • 作者关键词:   contact, deposition, encapsulation, graphene, process integration
  • 出版物名称:   BEILSTEIN JOURNAL OF NANOTECHNOLOGY
  • ISSN:   2190-4286
  • 通讯作者地址:   Infineon Technol AG
  • 被引频次:   4
  • DOI:   10.3762/bjnano.8.107
  • 出版年:   2017

▎ 摘  要

Since 2004 the field of graphene research has attracted increasing interest worldwide. Especially the integration of graphene into microelectronic devices has the potential for numerous applications. Therefore, we summarize the current knowledge on this aspect. Surveys show that considerable progress was made in the field of graphene synthesis. However, the central issue consists of the availability of techniques suitable for production for the deposition of graphene on dielectric substrates. Besides, the encapsulation of graphene for further processing while maintaining its properties poses a challenge. Regarding the graphene/metal contact intensive research was done and recently substantial advancements were made towards contact resistances applicable for electronic devices. Generally speaking the crucial issues for graphene integration are identified today and the corresponding research tasks can be clearly defined.